|
This course introduces the beginning graduate student to the fabrica- tion of solid-state devices and integrated circuits. The course pre- sents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation toll such as SUPREM. Associated are a lab for on campus section (01), and discussion of laboratory results and a graduate paper for distance learning-section (90). The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety. Class 3, Lab 3, Credit 4 (S)
|
